Metal Oxide Thin Films: Synthesis, Characterization and Applications

doi:10.3390/books978-3-0365-1057-6

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https://mdpi.com/books/pdfview/book/5399

Contributor(s)

Rauwel, habil. Erwan (editor)

Rauwel, Protima (editor)

Language

English

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Abstract

This Special Issue will compile recent developments in the field of metal oxide thin film deposition. The articles presented in this Special Issue will cover various topics, ranging from, but not limited to, the optimization of deposition methods, thin film preparations, the functionalization of surfaces with targeted applications, nanosensors, catalysis, electronic devices, biocidal coating, and the synthesis of nanostructures via the accurate control of thin film deposition methods, among others. Topics are open to metal oxide thin film deposition and characterization for the development of applications.

URI

https://directory.doabooks.org/handle/20.500.12854/81057

Keywords

plasma electrolytic oxidation; electrical characteristic; anodizing; SEM; aluminum; low-temperature fabrication; ions adsorption; IGZO TFTs; device performance; oxidation; wide-bandgap semiconductor; α-Ga2O3; mist chemical vapor deposition (mist-CVD); carrier gas; transparent semiconductor; cellulose; tribological performance; stability; MAO (micro-arc oxidation) coating; self-lubricating; gadolinium cobaltites; atomic layer deposition; β-diketonates; ozone; preferential crystal growth orientation; high-aspect-ratio substrate; metal oxide thin films; ALD; crystallography; epitaxy; NiTiO3; tin oxide; thin films; atmospheric pressure chemical vapour deposition transport properties; magnetoresistance; impedance spectroscopy; charge carrier mobility; dynamic hot-probe measurements; indium-tin oxide; aluminum-zinc oxide; magnetron co-sputtering; bismuth ferrite; La-doping; piezoelectricity; sol–gel; n/a