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dc.contributor.editorRauwel, habil. Erwan
dc.contributor.editorRauwel, Protima
dc.date.accessioned2022-05-06T11:25:01Z
dc.date.available2022-05-06T11:25:01Z
dc.date.issued2022
dc.identifierONIX_20220506_9783036510569_123
dc.identifier.urihttps://directory.doabooks.org/handle/20.500.12854/81057
dc.description.abstractThis Special Issue will compile recent developments in the field of metal oxide thin film deposition. The articles presented in this Special Issue will cover various topics, ranging from, but not limited to, the optimization of deposition methods, thin film preparations, the functionalization of surfaces with targeted applications, nanosensors, catalysis, electronic devices, biocidal coating, and the synthesis of nanostructures via the accurate control of thin film deposition methods, among others. Topics are open to metal oxide thin film deposition and characterization for the development of applications.
dc.languageEnglish
dc.subject.classificationthema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issuesen_US
dc.subject.classificationthema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues::TBX History of engineering and technologyen_US
dc.subject.classificationthema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TG Mechanical engineering and materials::TGM Materials scienceen_US
dc.subject.otherplasma electrolytic oxidation
dc.subject.otherelectrical characteristic
dc.subject.otheranodizing
dc.subject.otherSEM
dc.subject.otheraluminum
dc.subject.otherlow-temperature fabrication
dc.subject.otherions adsorption
dc.subject.otherIGZO TFTs
dc.subject.otherdevice performance
dc.subject.otheroxidation
dc.subject.otherwide-bandgap semiconductor
dc.subject.otherα-Ga2O3
dc.subject.othermist chemical vapor deposition (mist-CVD)
dc.subject.othercarrier gas
dc.subject.othertransparent semiconductor
dc.subject.othercellulose
dc.subject.othertribological performance
dc.subject.otherstability
dc.subject.otherMAO (micro-arc oxidation) coating
dc.subject.otherself-lubricating
dc.subject.othergadolinium cobaltites
dc.subject.otheratomic layer deposition
dc.subject.otherβ-diketonates
dc.subject.otherozone
dc.subject.otherpreferential crystal growth orientation
dc.subject.otherhigh-aspect-ratio substrate
dc.subject.othermetal oxide thin films
dc.subject.otherALD
dc.subject.othercrystallography
dc.subject.otherepitaxy
dc.subject.otherNiTiO3
dc.subject.othertin oxide
dc.subject.otherthin films
dc.subject.otheratmospheric pressure chemical vapour deposition transport properties
dc.subject.othermagnetoresistance
dc.subject.otherimpedance spectroscopy
dc.subject.othercharge carrier mobility
dc.subject.otherdynamic hot-probe measurements
dc.subject.otherindium-tin oxide
dc.subject.otheraluminum-zinc oxide
dc.subject.othermagnetron co-sputtering
dc.subject.otherbismuth ferrite
dc.subject.otherLa-doping
dc.subject.otherpiezoelectricity
dc.subject.othersol–gel
dc.subject.othern/a
dc.titleMetal Oxide Thin Films: Synthesis, Characterization and Applications
dc.typebook
oapen.identifier.doi10.3390/books978-3-0365-1057-6
oapen.relation.isPublishedBy46cabcaa-dd94-4bfe-87b4-55023c1b36d0
oapen.relation.isbn9783036510569
oapen.relation.isbn9783036510576
oapen.pages144
oapen.place.publicationBasel


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