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dc.contributor.authorSeo, Jung-Hun*
dc.date.accessioned2021-02-12T08:35:26Z
dc.date.available2021-02-12T08:35:26Z
dc.date.issued2019*
dc.date.submitted2019-08-28 11:21:27*
dc.identifier35950*
dc.identifier.urihttps://directory.doabooks.org/handle/20.500.12854/62681
dc.description.abstractWhile group IV or III-V based device technologies have reached their technical limitations (e.g., limited detection wavelength range or low power handling capability), wide bandgap (WBG) semiconductors which have band-gaps greater than 3 eV have gained significant attention in recent years as a key semiconductor material in high-performance optoelectronic and electronic devices. These WBG semiconductors have two definitive advantages for optoelectronic and electronic applications due to their large bandgap energy. WBG energy is suitable to absorb or emit ultraviolet (UV) light in optoelectronic devices. It also provides a higher electric breakdown field, which allows electronic devices to possess higher breakdown voltages. This Special Issue seeks research papers, short communications, and review articles that focus on novel synthesis, processing, designs, fabrication, and modeling of various WBG semiconductor power electronics and optoelectronic devices.*
dc.languageEnglish*
dc.subjectTA1-2040*
dc.subjectTK1-9971*
dc.subjectT1-995*
dc.subject.classificationthema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issues::TBX History of engineering and technologyen_US
dc.subject.otherohmic contact*
dc.subject.othern/a*
dc.subject.otherMESFET*
dc.subject.otheroptical band gap*
dc.subject.otherwide-bandgap semiconductor*
dc.subject.otherannealing temperature*
dc.subject.otherjunction termination extension (JTE)*
dc.subject.otherchannel length modulation*
dc.subject.othersilicon carbide (SiC)*
dc.subject.otheramorphous InGaZnO (a-IGZO)*
dc.subject.otherlight output power*
dc.subject.otherGaN*
dc.subject.otherelectrochromism*
dc.subject.otherlarge signal performance*
dc.subject.otherpassivation layer*
dc.subject.other4H-SiC*
dc.subject.otherpositive gate bias stress (PGBS)*
dc.subject.otherasymmetric power combining*
dc.subject.otherultrahigh upper gate height*
dc.subject.otherhigh electron mobility transistors*
dc.subject.otherspace application*
dc.subject.othergallium nitride (GaN)*
dc.subject.otherphase balance*
dc.subject.otheredge termination*
dc.subject.otherdistributed Bragg reflector*
dc.subject.othercathode field plate (CFP)*
dc.subject.otherammonothermal GaN*
dc.subject.otheranode field plate (AFP)*
dc.subject.otherW band*
dc.subject.otherGaN high electron mobility transistor (HEMT)*
dc.subject.other1T DRAM*
dc.subject.othergrowth of GaN*
dc.subject.othertungsten trioxide film*
dc.subject.otherthin-film transistor (TFT)*
dc.subject.othermicron-sized patterned sapphire substrate*
dc.subject.otherpower added efficiency*
dc.subject.otherT-anode*
dc.subject.otheranalytical model*
dc.subject.otherAlGaN/GaN*
dc.subject.otherharsh environment*
dc.subject.otherhigh-temperature operation*
dc.subject.otheramplitude balance*
dc.subject.otherbuffer layer*
dc.subject.othercharacteristic length*
dc.subject.otherKu-band*
dc.subject.otherDIBL effect*
dc.subject.otherI–V kink effect*
dc.subject.otherflip-chip light-emitting diodes*
dc.subject.otherhigh electron mobility transistors (HEMTs)*
dc.subject.otherpower amplifier*
dc.subject.othersidewall GaN*
dc.subject.otherexternal quantum efficiency*
dc.subject.otherbreakdown voltage (BV)*
dc.subject.otherthreshold voltage (Vth) stability*
dc.subject.otherregrown contact*
dc.subject.otherAlGaN/GaN HEMT*
dc.subject.otherTCAD*
dc.subject.otherhigh electron mobility transistor (HEMT)*
dc.titleWide Bandgap Semiconductor Based Micro/Nano Devices*
dc.typebook
oapen.identifier.doi10.3390/books978-3-03897-843-5*
oapen.relation.isPublishedBy46cabcaa-dd94-4bfe-87b4-55023c1b36d0*
oapen.relation.isbn9783038978435*
oapen.relation.isbn9783038978428*
oapen.pages138*
oapen.edition1st*


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