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dc.contributor.editorHo Yeap, Kim
dc.contributor.editorNisar, Humaira
dc.date.accessioned2023-12-01T16:39:41Z
dc.date.available2023-12-01T16:39:41Z
dc.date.issued2018
dc.identifierONIX_20231201_9781789234978_1143
dc.identifier.urihttps://directory.doabooks.org/handle/20.500.12854/130034
dc.description.abstractIn this book, Complementary Metal Oxide Semiconductor ( CMOS ) devices are extensively discussed. The topics encompass the technology advancement in the fabrication process of metal oxide semiconductor field effect transistors or MOSFETs (which are the fundamental building blocks of CMOS devices) and the applications of transistors in the present and future eras. The book is intended to provide information on the latest technology development of CMOS to researchers, physicists, as well as engineers working in the field of semiconductor transistor manufacturing and design.
dc.languageEnglish
dc.subject.classificationthema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TJ Electronics and communications engineering::TJF Electronics engineering::TJFD Electronic devices and materialsen_US
dc.subject.othercmos, aerospace, process, strain, electron energy loss spectroscopy
dc.titleComplementary Metal Oxide Semiconductor
dc.typebook
oapen.identifier.doi10.5772/intechopen.71097
oapen.relation.isPublishedBy78a36484-2c0c-47cb-ad67-2b9f5cd4a8f6
oapen.relation.isbn9781789234978
oapen.relation.isbn9781789234961
oapen.relation.isbn9781838815127
oapen.imprintIntechOpen
oapen.pages160


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