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dc.contributor.editorZschech, Ehrenfried
dc.contributor.editorSinclair, Robert
dc.contributor.editorMartins, Rodrigo
dc.contributor.editorSebastiani, Marco
dc.contributor.editorSartori, Sabrina
dc.date.accessioned2022-01-11T13:41:58Z
dc.date.available2022-01-11T13:41:58Z
dc.date.issued2021
dc.identifierONIX_20220111_9783036507569_512
dc.identifier.urihttps://directory.doabooks.org/handle/20.500.12854/76777
dc.description.abstractThis Special Issue “Characterization of Nanomaterials” collects nine selected papers presented at the 6th Dresden Nanoanalysis Symposium, held at Fraunhofer Institute for Ceramic Technologies and Systems in Dresden, Germany, on 31 August 2018. Following the specific motto of this annual symposium “Materials challenges—Micro- and nanoscale characterization”, it covered various topics of nanoscale materials characterization along the whole value and innovation chain, from fundamental research up to industrial applications. The scope of this Special Issue is to provide an overview of the current status, recent developments and research activities in the field of nanoscale materials characterization, with a particular emphasis on future scenarios. Primarily, analytical techniques for the characterization of thin films and nanostructures are discussed, including modeling and simulation. We anticipate that this Special Issue will be accessible to a wide audience, as it explores not only methodical aspects of nanoscale materials characterization, but also materials synthesis, fabrication of devices and applications.
dc.languageEnglish
dc.subject.classificationthema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TB Technology: general issuesen_US
dc.subject.otherphysical vapor deposition
dc.subject.othermagnetron sputtering
dc.subject.otherAlN/Al coating
dc.subject.othersilicon substrate
dc.subject.otherresidual stresses
dc.subject.otherwafer curvature method
dc.subject.othernanoscale residual stress profiling
dc.subject.otherindentation failure modes
dc.subject.othernanoindentation adhesion
dc.subject.otherintermetallic phases
dc.subject.othergrowth kinetics
dc.subject.otherAl–Ni system
dc.subject.otherzinc oxide
dc.subject.othernanoparticles
dc.subject.otherpaper transistors
dc.subject.otherprinted electronics
dc.subject.otherelectrolyte-gated transistors
dc.subject.othermicrowave synthesis
dc.subject.otheroxide dissociation
dc.subject.otherdoping
dc.subject.otherrare earth ions
dc.subject.otherupconversion
dc.subject.otherliquid alloys
dc.subject.other2D materials
dc.subject.otherthin films
dc.subject.otherGa–Sn–Zn alloys
dc.subject.othergallium alloys
dc.subject.othernanoanalysis
dc.subject.otherlithium-ion
dc.subject.othernickel–manganese–cobalt oxide (NMC)
dc.subject.otherleaching
dc.subject.otherrecycling
dc.subject.otherrecover
dc.subject.otherdegradation
dc.subject.otherSEM-EDX
dc.subject.otherRaman spectroscopy
dc.subject.otherresistive switching memories
dc.subject.othermulti-level cell
dc.subject.othercopper oxide
dc.subject.othergrain boundaries
dc.subject.otheraluminum oxide
dc.subject.otherp-type TFT
dc.subject.otherp-type oxide semiconductors
dc.subject.otherSnO electrical properties
dc.subject.otheroxide structure analysis
dc.subject.otherToF-SIMS 3D imaging
dc.subject.othercompositional depth profiling
dc.subject.otherhigh aspect ratio (HAR) structures
dc.subject.othersilicon doped hafnium oxide (HSO) ALD deposition
dc.subject.otherlateral high aspect ratio (LHAR)
dc.subject.otherToF-SIMS analysis
dc.subject.othern/a
dc.titleCharacterization of Nanomaterials: Selected Papers from 6th Dresden Nanoanalysis Symposiumc
dc.typebook
oapen.identifier.doi10.3390/books978-3-0365-0757-6
oapen.relation.isPublishedBy46cabcaa-dd94-4bfe-87b4-55023c1b36d0
oapen.relation.isbn9783036507569
oapen.relation.isbn9783036507576
oapen.pages139
oapen.place.publicationBasel, Switzerland


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