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dc.contributor.authorHaikel Jelassi*
dc.contributor.authorDjamel Benredjem*
dc.date.accessioned2021-02-11T23:05:50Z
dc.date.available2021-02-11T23:05:50Z
dc.date.issued2019*
dc.date.submitted2019-10-03 07:51:52*
dc.identifier37774*
dc.identifier.urihttps://directory.doabooks.org/handle/20.500.12854/56377
dc.description.abstractUsually called the ""fourth state of matter,"" plasmas make up more than 99% of known material. In usual terminology, this term generally refers to partially or totally ionized gas and covers a large number of topics with very different characteristics and behaviors. Over the last few decades, the physics and engineering of plasmas was experiencing a renewed interest, essentially born of a series of important applications such as thin-layer deposition, surface treatment, isotopic separation, integrated circuit etchings, medicine, etc. Plasma Science & Technology - Basic Fundamentals and Modern Applications presents the basic fundamentals behind plasma physics along with some of their most important modern applications.*
dc.languageEnglish*
dc.subjectQC1-999*
dc.subject.otherPhysical Sciences*
dc.subject.otherEngineering and Technology*
dc.subject.otherPlasma Physics*
dc.subject.otherPhysics*
dc.titlePlasma Science and Technology - Basic Fundamentals and Modern Applications*
dc.typebook
oapen.identifier.doi10.5772/intechopen.72359*
oapen.relation.isPublishedBy78a36484-2c0c-47cb-ad67-2b9f5cd4a8f6*
oapen.relation.isbn9781789852400*
oapen.relation.isbn9781789852394*
oapen.pages328*
oapen.edition1st Edition*


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