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dc.contributor.editorNeralla, Sudheer
dc.date.accessioned2023-12-01T15:26:06Z
dc.date.available2023-12-01T15:26:06Z
dc.date.issued2016
dc.identifierONIX_20231201_9789535125730_552
dc.identifier.urihttps://directory.doabooks.org/handle/20.500.12854/129443
dc.description.abstractThis book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations.
dc.languageEnglish
dc.subject.classificationthema EDItEUR::P Mathematics and Science::PN Chemistry::PNR Physical chemistry::PNRS Solid state chemistryen_US
dc.subject.otherthin films, chemical vapour deposition, carbon nanotubes, polymers, composite, photoluminescence
dc.titleChemical Vapor Deposition
dc.title.alternativeRecent Advances and Applications in Optical, Solar Cells and Solid State Devices
dc.typebook
oapen.identifier.doi10.5772/61559
oapen.relation.isPublishedBy78a36484-2c0c-47cb-ad67-2b9f5cd4a8f6
oapen.relation.isbn9789535125730
oapen.relation.isbn9789535125723
oapen.relation.isbn9789535141877
oapen.imprintIntechOpen
oapen.pages290


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